![]() X-ray Diffraction at Elevated Temperatures: A Method for In Situ Process Analysis
ISBN: 978-0-471-18726-4
Hardcover
268 pages
February 1993
US $245.00
This price is valid for United States. Change location to view local pricing and availability. |
Instructors may request an evaluation copy for this title.
|
In light of the growing importance and availability of intense x-ray sources and position-sensitive detectors, this book offers comprehensive treatment of the principles, instrumentation, and applications of x-ray diffraction at elevated temperatures. Coverage explores the uses of intense x-ray sources and position-sensitive detectors for assessing these sources, and offers comparisons with complementary thermal analysis techniques (differential scanning calorimetry, thermogravimetric analysis, thermal mechanical analysis) for carrying out phase identification, texture analysis, and grain size measurement by way of in situ process analysis at elevated temperatures in a broad range of fields, including crystallography, thermal analysis, materials science, chemical and electrical analysis.

