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Process Improvement in the Electronics Industry, 2nd Edition

ISBN: 978-0-471-20957-7
648 pages
November 2002
Process Improvement in the Electronics Industry, 2nd Edition (0471209570) cover image

Description

A systemic approach to continuous process improvement

Process improvement is rapidly becoming one of the most significant factors in achieving organizational success. Nearly every aspect of an organization can gain from process improvement and innovation-leadership and management, visioning and planning, research and development, marketing and sales, manufacturing and distribution. Emphasizing manufacturing process improvement but covering the human side as well, Process Improvement in the Electronics Industry, Second Edition describes a systemic approach to continuous process improvement.

This book is based on the authors' experience in development and implementation of a comprehensive system of continuous process improvement and innovation at AMD. The Second Edition adds valuable new insights and information on developments since the publication of the highly successful previous edition. Written to serve equally well as a comprehensive guide for engineers and technicians in process management, and as a reference for managers in industry and graduate students, the book explains how to develop and implement systems for continuous process improvement in all areas of an organization, including:
* The concepts of process improvement, process management, and systems thinking
* Probability and statistics basics
* How to control, measure, and report on high-quality processes
* Zero defects and the six sigma methodology
* On-line and off-line design of experiments
* Managing sampling systems in a low ppm environment


Including numerous case studies and suggestions for implementing a process control program based on the actual experiences of manufacturers and suppliers, Process Improvement in the Electronics Industry, Second Edition remains a compellingly useful reference for anyone charged with or interested in achieving greater efficiency in industry, manufacturing, leadership, and other areas.
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Table of Contents

Preface.

Acknowledgment.

PART I: THE HUMAN SIDE OF PROCESS IMPROVEMENT.

The Concepts of Process Improvement.

Improving the Management Process.

Systems and Systems Thinking.

Creativity and Innovation.

Some Basic Concepts of Variation.

PART II: PROCESS CONTROL AND CAPABILITY STUDIES.

Some Important Probability Distributions.

Statistical Process Control.

Measurement and Inspection Capability Studies.

Process Capability Study.

Working with Skewed Distributions.

Engineering Specifications.

Zero Defects Process Capability.

Managing Sampling Systems in a Low ppm Environment.

PART III: OFF-LINE AND ON-LINE DESIGN OF EXPERIMENTS.

Off-Line Design of Experiments.

On-Line Design of Experiments.

APPENDICES.

Appendix A: The Effect of Tampering with the Process.

Appendix B: Factors for Constructing Control Charts.

Appendix C: Area Under Normal Distribution (Z Table).

Appendix D: Tables for Testing Skewness and Kurtosis.

Appendix E: Percentage Points of the F Distribution.

Appendix F: Orthogonal Arrays.

Appendix G: Omega Transformation Table.

Appendix H: Percentage Points of the t Distribution.

Appendix I: Percentage Points of the x? Distribution.

Appendix J: Cumulative Poisson Distribution.

Appendix K: Supporting Theory for the CCC Chart and the Process Rejection Sampling Plan.

Appendix L: Value of e?-x.

Appendix M: One-Sided and Two-Sided Statistical Tolerance Intervals.

Appendix N: A Quick Method to Design the OC and AOQ Curves for c = 0 Sampling Plans.

Appendix O: np Values for Various Confidence Intervals, Probabilities of Acceptance, and Numbers of Nonconforming Units.

Glossary.

Index.
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Author Information

YEFIM FASSER, PhD, is Director of Systems and Statistical Engineering at Advanced Micro Devices, Inc.

DONALD BRETTNER is Group Vice President at Advanced Micro Devices, Inc.

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Reviews

"...well written and covers, in a useful fashion, an extremely wide range of relevant subjects." (Technometrics, Vol. 45, No. 4, November 2003)
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