Silicon Technologies: Ion Implantation and Thermal TreatmentISBN: 978-1-84821-231-2
Hardcover
368 pages
July 2011, Wiley-ISTE
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The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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