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Industrial Plasma Technology: Applications from Environmental to Energy Technologies

Yoshinobu Kawai (Editor), Hideo Ikegami (Editor), Noriyoshi Sato (Editor), Akihisa Matsuda (Editor), Kiichiro Uchino (Editor), Masayuki Kuzuya (Editor), Akira Mizuno (Editor)
ISBN: 978-3-527-32544-3
464 pages
April 2010
Industrial Plasma Technology: Applications from Environmental to Energy Technologies (3527325441) cover image
Clearly structured in five major sections on applications, this monograph covers such hot technologies as nanotechnology, solar cell technology, biomedical and clinical applications, and sustainability.
Since the topic, applications and readers are highly interdisciplinary, the book bridges materials science, industrial chemistry, physics, and engineering -- making it a must-have for researchers in industry and academia, as well as those working in application-oriented plasma technology.
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PREFACE
INTRODUCTION TO PLASMAS
Plasmas
Discharge Plasmas
ENVIRONMENTAL APPLICATION OF NONTHERMAL PLASMA
ATMOSPHERIC PLASMA AIR POLLUTION CONTROL, SOLID WASTE, AND WATER TREATMENT TECHNOLOGIES: FUNDAMENTAL AND OVERVIEW
Introduction
Type of Plasmas
Plasma Chemistry
Plasma Reactor
Determination of Plasma Parameters and the Other Phenomena
Engineering and Economics
Concluding Remarks
References
OPTICAL DIAGNOSTICS FOR HIGH-PRESSURE NONTHERMAL PLASMA ANALYSIS
Introduction
Experimental Examples
Conclusions
References
LASER INVESTIGATIONS OF FLOW PATTERNS IN ELECTROSTATIC PRECIPITATORS AND NONTHERMAL PLASMA REACTORS
Introduction
PIV Experimental Setups
Conclusions
Acknowledgment
References
WATER PLASMAS FOR ENVIRONMENTAL APPLICATION
Introduction
Water Plasma Generation and Its Characteristics
Decomposition of halogenated Hydrocarbons
Conclusion
References
CHEMISTRY OF ORGANIC POLLUTANTS IN ATMOSPHERIC PLASMAS
Introduction
Experimental
Results and Discussion
Conclusions
Acknowledgments
References
GENERATION AND APPLICATION OF WIDE AREA PLASMA
Introduction
AirFlow Control
Aerodynamic Plasma Actuators
Particle Destruction
Large Sliding Discharge
Conclusion
References
NONTHERMAL PLASMA-BASED SYSTEM FOR EXHAUST TREATMENT UNDER REDUCED ATMOSPHERE OF PYROLYSIS GASES
Introduction
Experimental
Results
Conclusions
Acknowledgments
References
PHARMACEUTICAL AND BIOMEDICAL ENGINEERING BY PLASMA TECHNIQUES
Introduction
Nature of Plasma-Induced Polymer Radicals
Pharmaceutical Engineering for DDS Preparation by Plasma Techniques
Biomedical Engineering by Plasma Techniques
Conclusion
Acknowledgments
References
TARGETING DENDRITIC CELLS WITH CARBON MAGNETIC NANOPARTICLES MADE BY DENSE-MEDIUM PLASMA TECHNOLOGY
References
APPLICATIONS OF PULSED POWER AND PLASMAS TO BIOSYSTEMS AND LIVING ORGANISMS
Introduction
Pulsed-Power Source Using Magnetic Pulse Compression System
Discharge Plasmas by Pulsed Power
Action of Pulsed Power and Discharge Plasma to Biosystem
Summary
References
APPLICATIONS OF PLASMA POLYMERIZATION IN BIOMATERIALS
Introduction
Example 1: Improving Surfaces for Blood Biocompatibility
Example 2: Foreign Body Response
Example 3: Extended Wear Contact Lenses
Example 4: Platform for Immobilizing a Biomolecule
Example 5: An Improved Surface Plasmon Resonance Biosensor
Conclusions
References
PLASMA STERILIZATION AT NORMAL ATMOSPHERIC PRESSURE
Introduction
Experimental Schemes
Experimental Result
Conclusion
Acknowledgments
References
ELIMINATION OF PATHOGENIC BIOLOGICAL RESIDUALS BY MEANS OF LOW-PRESSURE INDUCTIVELY COUPLED PLASMA DISCHARGE
Introduction
Experimental
Results
Conclusions
Acknowledgments
References
STERILIZATION AND PROTEIN TREATMENT USING OXYGEN RADICALS PRODUCED BY RF DISCHARGE
Introduction
Experimental Procedure
Generation of Oxygen Radicals
Sterilization of Medical Equipments
Decomposition of Protein's Structure
References
HYDROPHILICITY AND BIOACTIVITY OF A POLYETHYLENE TEREPHTHALATE SURFACE MODIFIED BY PLASMA-INITIATED GRAFT POLYMERIZATION
Introduction
Experimental
Results and Discussion
Conclusions
References
STRATEGIES AND ISSUES ON THE PLASMA PROCESSING OF THIN-FILM SILICON SOLAR CELLS
Introduction
Growth Process of a-Si: H and ?c-Si : H by PECVD
Growth of High-Quality a-Sie : H
Concept of Protocrystal a-Si : H (Stable a-Sie : H)
Growth of High-Quality ?c-Si : H
Summary
Reference
CHARACTERISTICS OF VHF PLASMA WITH LARGE AREA
Introduction
Development of Balanced Power Feeding Method
Characteristics of VHF Plasma
Summary
References
DEPOSITION OF A-SI : H FILMS WITH HIGH STABILITY AGAINST LIGHT EXPOSURE BY REDUCING DEPOSITION OF NANOPARTICLES FORMED IN SIH4 DISCHARGES
Introduction
Formation Mechanism of Nanoparticles in Silane Discharges
Contribution of Higher Order Silane Molecules and Nanoparticles to SiH2 Bond Formation in Films
Effects of Nanoparticles on a-Si : H Qualities
High Rate Deposition of a-Si : H Films of High Stability against Light Exposure Using Multihollow Discharge Plasma CVD
Conclusions
Acknowledgments
References
DIAGNOSTICS AND MODELING OF SIH4/H2 PLASMAS FOR THE DEPOSITION OF MICROCRYSTALLINE SILICON: THE CASE OF DUAL-FREQUENCY SOURCES
Introduction
Experimental
Model Description
Results and Discussion
Conclusions
Acknowledgments
References
INTRODUCTION TO DIAMOND-LIKE CARBONS
DIAMOND-LIKE CARBON FOR APPLICATIONS
Introduction
Growth Rates
Basic Properties
Stress
Applications of DLC
MEMs
Electronic Applications
Bioactive Surfaces
Conclusions
Acknowledgments
References
APPLICATIONS OF DLCS TO BIOPROCESSING
Introduction
High-Tenacity DLC Tin Films for Stents
Applications of DLC Films to Coronary Drug-Eltuing Stent
DLC Films with Controlled Zeta Potential of Biomaterials
Characerization of Biomimetic DLC and In vitro Biocompatibility Evaluation
Conclusion
Acknowledgments
References
PLASMA PROCESSING OF NANOCRYSTALLINE SEMICONDUCTIVE CUBIC BORON NITRIDE THIN FILMS
Introduction
Fundamental Properties of cBN
Growth of cBN Thin Films
Doping Processes and Electrical Characterization
Conclusion
References
FUNDAMENTALS ON TRIBOLOGY OF PLASMA-DEPOSITED DIAMOND-LIKE CARBON FILMS
Introduction
Special Case of DLC Coatings
Superlubricity of DLC Coatings
Conclusion
References
DIAMOND-LIKE CARBON THIN FILMS GROWN IN PULSED-DC PLASMAS
Introduction
Experimental Details
Results and Discussion
Conclusions
Acknowledgments
References
PLASMA DEPOSITION OF N-TIO2 THIN FILMS
Introduction
Experimental Setup and Diagnostic Techniques
Results and Discussion
Acknowledgments
References
INVESTIGATION OF DLC AND MULTILAYER COATINGS HYDROPHOBIC CHARACTER FOR BIOMEDICAL APPLICATIONS
Introduction
Experimental Setup
Results and Discussions
Conclusions
Acknowledgments
References
CREATION OF NOVEL ELECTROMAGNETIC AND REACTIVE MEDIA FROM MICROPLASMAS
Introduction
Microplasma in Single Use as Plasma
Microplasma Integration for Large-Area Material Processing
Microplasma Integration for Electromagnetic Media
Concluding Remarks and Perspectives
Acknowledgments
References
NANOBLOCK ASSEMBLY USING PULSE RF DISCHARGES WITH AMPLITUDE MODULATION
Introduction
Formation of Nanoblocks and Their Agglomeration
Assembly of Nanoblocks in Gas Phase Using Agglomeration
Conlusions
Acknowledgments
References
THOMSON SCATTERING DIAGNOSTICS OF DISCHARGE PLASMAS
Introduction
Application to Low-Pressure Plasmas
Diagnostics of PDP Plasmas
Diagnostics of EUV Plasmas
CRYSTALLIZED NANODUST PARTICLES GROWTH IN LOW-PRESSURE COLD PLASMAS
Introduction
Description of the Experimental Setup
Detection of Nanocrystallites Formation in the Plasma Gas Phase
Atomic Structure of the Nanocrystallites
Size and Crystalline Volume Fraction Measurements
Gas Temperature Effects on Dust Nanoparticle Nucleation and Growth
Conclusions
References
COLLECTION AND REMOVAL OF FINE PARTICLES IN PLASMA CHAMBERS
Introduction
NFP-collector
Ditch Gudance
Plate Cleaning
Effects on Particles Produced in Plasmas
Conclusions
Acknowledgments
References

INDEX
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Hideo Ikegami is Professor Emeritus of both Nagoya University and National Institute for Fusion Science in Nagoya, Japan. His primary interest is basic plasma physics and various plasma applications. In 1996, he created a consulting company of plasma application technology, Technowave Inc., and served as president. He is one of the editors of Advanced Plasma Technology (Wiley-VCH, 2007).

Noriyoshi Sato has worked in research and education on plasma physics and is now Professor Emeritus at Tohoku University, Japan. His primary interest is basic plasma behaviour related to various plasma applications. He is elevating his works in collaboration with companies. He is one of the editors of Advanced Plasma Technology (Wiley-VCH, 2007).

Akihisa Matsuda is Special Guest Professor at the Graduate School of Engineering Science of Osaka Univeristy, Japan, since 2007, after being Director of Research Initiative for Thin Film Silicon Solar Cells at the National Institute of Advanced Industrial Science and Technology (AIST), Japan. His main field of interest are plasma-process diagnostics and process control for thin film silicon solar cells.

Kiichiro Uchino is currently Professor at the Department of Applied Science for Electronics and Materials at Kyushu University in Fukuoka, Japan. He is working on laser-aided diagnostics of plasmas and various industrial plasma applications.

Masayuki Kuzuya is currently the Dean of College of Pharmaceutical Sciences, and Professor of Pharmaceutical Physical Chemistry at Matsuyama University, Japan. His research interest is in the field of fundamental studies of organic plasma chemistry and its bio- and pharmaceutical applications.

Akira Mizuno is Professor of the Department of Ecological Engineering at Toyohashi University of Technology. His research includes applied electrostatics and high-voltage engineering, which includes electrostatic precipitation, environmental application of plasma, sterilization and other environmental friendly technologies as well as manipulation and measurement of single DNA molecules. He is editor of the International Journal of Plasma Environmental Science and Technology.

Yoshinobu Kawai works as Research Professor at Interdisciplinary Graduate School of Engineering Sciences at Kyushu University, Japan, since 1974. He is expert in production of large diameter plasma in the frequency range from VHF to microwave for amorphous and microcrystalline silicon solar cell and etching. He is one of the editors of Advanced Plasma Technology (Wiley-VCH, 2007).
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