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Advanced Nano Deposition Methods

Yuan Lin (Editor)
ISBN: 978-3-527-34025-5
328 pages
December 2016
Advanced Nano Deposition Methods (3527340254) cover image

Description

This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail.
Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.
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Table of Contents

List of Contributors XIII

1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure 1
Chunrui Ma and Chonglin Chen

1.1 Introduction 1

1.2 Pulsed Laser Deposition System Setup 2

1.3 Advantages and Disadvantages of Pulsed Laser Deposition 3

1.4 TheThermodynamics and Kinetics of Pulsed Laser Deposition 3

1.5 Monitoring of Growth Kinetics 8

1.6 Fundamental Parameters inThin Film Growth 10

1.7 Pulsed Laser Deposition for Complex Oxide Thin Film Growth 13

1.8 Pulsed Laser Deposition for Nanostructure Growth 23

1.9 Variation of Pulsed Laser Deposition 24

1.10 Conclusion 24

References 25

2 Electron Beam Evaporation Deposition 33
Zhongping Wang and Zengming Zhang

2.1 Introduction 33

2.2 Electron Beam Evaporation System 35

2.3 Characterization ofThin Film 45

2.4 Summary 53

Acknowledgments 53

References 53

3 Nanostructures and Thin Films Deposited with Sputtering 59
Weiqing Yang

3.1 Introduction 59

3.2 Nanostructures with Sputtering 60

3.3 Thin Films Deposited with Sputtering 71

3.4 Summary 76

Acknowledgments 77

References 77

4 Nanostructures and Quantum Dots Development with Molecular Beam Epitaxy 81
Wen Huang

4.1 Introduction 81

4.2 Technology of MBE 82

4.3 Nanoheterostructures Fabricated by Molecular Beam Epitaxy 91

4.4 Quantum Dots Development with Molecular Beam Epitaxy 101

4.5 Summary 103

Acknowledgments 104

References 104

5 Carbon Nanomaterials and 2D Layered Materials Development with Chemical Vapor Deposition 105
Taisong Pan

5.1 Introduction 105

5.2 Carbon Nanotube Synthesis by Chemical Vapor Deposition 106

5.3 Graphene Synthesis by Chemical Vapor Deposition 112

5.4 Metal Dichalcogenide Synthesis by Chemical Vapor Deposition 115

5.5 Summary 119

References 120

6 Nanostructures Development with Atomic Layer Deposition 123
Hulin Zhang

6.1 Introduction 123

6.2 Reaction Mechanisms 125

6.3 Nanostructures Based on ALD 131

6.4 Summary 136

Acknowledgments 137

References 138

7 Nanomaterial Development with Liquid-Phase Epitaxy 141
Weiqing Yang

7.1 Introduction 141

7.2 Hydrothermal Method 142

7.3 Nanostructures Fabricated Using LPE 147

7.4 Summary 156

Acknowledgments 156

References 156

8 Nanostructural Thin Film Development with Chemical Solution Deposition 159
Yanda Ji and Yuan Lin

8.1 Introduction 159

8.2 Precursor Solution Preparation 159

8.3 Coating 162

8.4 Thermal Treatment 163

8.5 Control of the Microstructures in Thin Films Prepared by CSD Techniques 164

8.6 Examples of NanostructuralThin Films Prepared by CSD Techniques 167

8.7 Summary 174

References 175

9 Nanomaterial Development Using In Situ Liquid Cell Transmission Electron Microscopy 179
Xin Chen,Wangfan Zhou, Debiao Xie, and Hongliang Cao

9.1 Introduction 179

9.2 The Technological Development of In Situ Liquid Cell TEM 179

9.3 Nanomaterial Development Using In Situ Liquid Cell TEM Technology 185

9.4 Summary and Outlook 191

Acknowledgments 191

References 192

10 Direct-Writing Nanolithography 195
Min Gao

10.1 Introduction 195

10.2 Electron Beam Lithography 195

10.3 Focused Ion Beam Lithography 198

10.4 Gas-Assisted Electron and Ion Beam Lithography 200

10.5 SPM Lithography 201

10.6 Dip-Pen Lithography 205

10.7 Summary 206

Acknowledgments 207

References 207

11 3D Printing of Nanostructures 209
Min Gao

11.1 Introduction 209

11.2 3D Printing Processes 209

11.3 Types of 3D Printing 210

11.4 3D Direct LaserWriting by Multiphoton Polymerization 214

11.5 3D Printing Applications 217

11.6 Summary 219

Acknowledgments 220

References 220

12 Nanostructured Thin Film Solid Oxide Fuel Cells 223
Alex Ignatiev, Rabi Ebrahim, Mukhtar Yeleuov, Daniel Fisher, Xin Chen, NaijuanWu, and Serekbol Tokmoldin

12.1 Introduction 223

12.2 Solid Oxide Fuel Cells 223

12.3 Summary 237

Acknowledgments 237

References 237

13 Nanostructured Magnetic Thin Films and Coatings 239
Goran Rasic

13.1 Introduction 239

13.2 High-Frequency Devices 240

13.3 Magnetic Information Storage Devices 251

13.4 Summary 261

Acknowledgments 261

References 262

14 Phase Change Materials for Memory Application 267
Liangcai Wu and Zhitang Song

14.1 Introduction 267

14.2 Ge2Sb2Te5 and Its Properties’ Improvement 268

14.3 High-Speed and Lower-Power TiSbTe Materials 277

14.4 Summary 283

Acknowledgments 283

References 283

15 Nanomaterials and Devices on Flexible Substrates 285
Hulin Zhang

15.1 Introduction 285

15.2 Nanomaterials on Flexible Substrates 286

15.3 Devices on Flexible Substrates 292

15.4 Summary 300

Acknowledgments 301

References 301

Index 305

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Author Information

Yuan Lin obtained her PhD in condensed materials from the University of Science and Technology in Hefei, China, in 1999. She continued as a research associate in the Institute of Physics at the Chinese Academic Science in Bejing, China, followed by the University of Houston and Los Alamos National Laboratory, USA, as well as a senior engineer at Intel Corp., USA.
Currently, she is a Yangtze River Scholar Chair Professor at the University of Electronic Science and Technology in Chengdu, China. She has worked in the field of thin film and nanomaterials for about 20 years. Her area of expertise includes advanced material research using pulsed laser deposition, rf-sputtering and chemical-solution deposition.
Dr. Lin has authored more than 90 scientific publications and 13 patents.
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