Advanced Plasma TechnologyISBN: 978-3-527-40591-6
Hardcover
479 pages
February 2008
 Add to Cart
This price is valid for United States. Change location to view local pricing and availability.  Other Available Formats: E-book
|
Basic Approaches to Plasma Production and Control
N. Sato
Plasma Sources and Reactor Configurations
P. Colpo
Simulations for Low-Temperature Plasma Applications
J. K. Lee
Modeling and diagnostics of He discharges for treatment of polymers
D. Mataras
3-D Modelling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes
E. Ghedini
RF Plasma Sources for Semiconductor processing
F. F. Chen
Advanced Plasma Diagnostics for Thin Film Deposition
R. Engeln
Plasma Processing of Polymers by a Low-Frequency Discharge with Asymmetrical Configuration of Electrodes
F. Arefi-Khonsari and M. Tatoulian
Fundamentals on plasma deposition of fluorocarbon films
A. Milella
Plasma CVD processes for thin film Si solar cells
A. Matsuda
VHF Plasma Production for Solar Cells
Y. Kawai
Growth Control of Clusters in Reactive Plasmas and Its Application to High-stability a-Si Film Deposition
Y. Watanabe
Micro- and Nano-Structuring in Plasma-Processes for Biomaterials: Micro- and Nano-Features as Powerful Tools to Address Selective Biological Responses
E. Sardella
Chemical Immobilization of Biomolecules on Plasma Modified Substrates for Biomedical Applications
L. C. Lopez
In Vitro Methods to Assess the Biocompatibility of Plasma Modified Surfaces
M. Nardulli
Cold gas plasma in biology and medicine
E. Stoffels
Mechanisms of Sterilization and Decontamination of Surfaces by Low Pressure Plasma
F. Rossi
Application to Atmospheric Pressure Glow Plasma
M. Kogoma
Hydrocarbon and fluorocarbon thin films deposition in atmospheric pressure glow dielectric barrier discharges
F. Fanelli
Remark on Production of Atmospheric Pressure Non-Thermal Plasmas for Modern Application
R. Itatani
Present status and Future of Color Plasma Display
T. Shinoda
Characteristics of PDP Plasmas
H. Ikegami
Recent progress in plasma spray processing
T. Yoshida
Electrohydraulic Discharge Direct Plasma Water Treatment Processes
J.-S. Chang
Development and Physics Issues of an Advanced Space Propulsion
M. Inutake
N. Sato
Plasma Sources and Reactor Configurations
P. Colpo
Simulations for Low-Temperature Plasma Applications
J. K. Lee
Modeling and diagnostics of He discharges for treatment of polymers
D. Mataras
3-D Modelling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes
E. Ghedini
RF Plasma Sources for Semiconductor processing
F. F. Chen
Advanced Plasma Diagnostics for Thin Film Deposition
R. Engeln
Plasma Processing of Polymers by a Low-Frequency Discharge with Asymmetrical Configuration of Electrodes
F. Arefi-Khonsari and M. Tatoulian
Fundamentals on plasma deposition of fluorocarbon films
A. Milella
Plasma CVD processes for thin film Si solar cells
A. Matsuda
VHF Plasma Production for Solar Cells
Y. Kawai
Growth Control of Clusters in Reactive Plasmas and Its Application to High-stability a-Si Film Deposition
Y. Watanabe
Micro- and Nano-Structuring in Plasma-Processes for Biomaterials: Micro- and Nano-Features as Powerful Tools to Address Selective Biological Responses
E. Sardella
Chemical Immobilization of Biomolecules on Plasma Modified Substrates for Biomedical Applications
L. C. Lopez
In Vitro Methods to Assess the Biocompatibility of Plasma Modified Surfaces
M. Nardulli
Cold gas plasma in biology and medicine
E. Stoffels
Mechanisms of Sterilization and Decontamination of Surfaces by Low Pressure Plasma
F. Rossi
Application to Atmospheric Pressure Glow Plasma
M. Kogoma
Hydrocarbon and fluorocarbon thin films deposition in atmospheric pressure glow dielectric barrier discharges
F. Fanelli
Remark on Production of Atmospheric Pressure Non-Thermal Plasmas for Modern Application
R. Itatani
Present status and Future of Color Plasma Display
T. Shinoda
Characteristics of PDP Plasmas
H. Ikegami
Recent progress in plasma spray processing
T. Yoshida
Electrohydraulic Discharge Direct Plasma Water Treatment Processes
J.-S. Chang
Development and Physics Issues of an Advanced Space Propulsion
M. Inutake
Buy Both and Save 25%!
+
Advanced Plasma Technology (US $265.00)
-and- Econophysics: An Introduction (US $100.00)
Total List Price: US $365.00
Discounted Price: US $273.75 (Save: US $91.25)
