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Low Temperature Plasmas: Fundamentals, Technologies and Techniques, 2nd Edition

Rainer Hippler (Editor), Holger Kersten (Editor), Martin Schmidt (Editor), Karl H. Schoenbach (Editor)
ISBN: 978-3-527-40673-9
945 pages
March 2008
Low Temperature Plasmas: Fundamentals, Technologies and Techniques, 2nd Edition (3527406735) cover image
With its strong focus on the links between theory and experiment or technological process, this book presents the latest advances in our understanding of how plasmas behave. New contributions to this second edition cover dusty plasmas, cross-correlation spectroscopy, atmospheric pressure glow discharges, as well as applications in lightening, microelectronics, polymer surface modification, sterilization, biology and medicine.
Straddling the boundaries between physics, chemistry and materials science, this is of interest to a wide community.

From reviews of the first edition:
"... it makes a highly valuable contribution to the subject area and will be accessible to scientists and engineers working in the field." ChemPhysChem
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Characteristics of low-temperature plasmas under non-thermal conditions, a short summary
Electron kinetics in weakly ionized plasmas
Elementary collision processes in plasmaS
Fundamental processes of plasma-surface interactions
Modelling of plasma-wall Interaction
NEW Fundamentals of Dusty Plasmas (Melzer, Goree)
NEW Plasmas under microgravity
NEW Nucleation and growth of dust particles in low pressure cold plasmas (Boufendi)
Langmuir probe diagnostics of low-temperature plasmas
Diagnostics of non-equilibrium molecular plasmas using emission and absorption spectroscopy
Mass spectrometric diagnostics
NEW Cross-Correlation Spectroscopy of Non-Thermal Gas Discharges at Atmospheric Pressure
Ellipsometric analysis of plasma-treated surfaces
Characterization of thin solid films
Plasma sources
Reactive non-thermal plasmas - chemical quasi-equilibria, similarity principles and macroscopic kinetics
High pressure plasmas: dielectric-barrier and corona discharges - properties and technical applications
NEW Atmospheric Pressure Glow discharges
NEW High-Pressure Microdischarges
Transient plasma-assisted diesel exhaust remediation
NEW Transient Plasma Ignition
Plasma display panel
Low pressure discharge light sources
High-pressure plasma light sources
Plasma etching in microelectronics
Low temperature plasmas for polymer surface modification
NEW EUV Lamps
NEW Plasma etching in microelectronics
NEW Magnetron discharges for Thin Film Deposition
NEW Hollow Cathodes and plasma jetzs for thin film deposition
NEW Low-temperature plasmas for polymer surface modification
Plasma-enhanced deposition of superhard thin films
NEW Applications of Dusty plasmas
NEW Cold Plasma-Based Sterilization
NEW Plasmas for Sterilization II
NEW Cold gas plasmas in biology and medicine
Markets for plasma technology
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Rainer Hippler is full professor at the Institute of Physics, University of Greifswald. Together with the Max-Planck-Institute for Plasma Physics and the Institute of Low Temperature Plasma Physics in Greifswald the University represents an important center of competence for Plasma Physics and Plasma Technology. His main subjects are complex plasmas including thin film deposition, dusty plasmas, and deposition of nano-size particles on surfaces.

Holger Kersten teaches as professor at the Institute of Experimental and Applied Physics, University of Kiel. He is working in the field of plasma physics and plasma technology, with emphasis on complex (dusty) plasmas, plasma surface interaction, and ion beam diagnostics.

Martin Schmidt is a leading scientist at the Institute of Low Temperature Plasma Physics in Greifswald, a center of application-oriented research which belongs to the Leibniz-Science Community.

Karl H. Schoenbach holds the Batten Endowed Chair for Bioelectrics at Old Dominion University in Norfolk, Virginia, where he serves as Director of the Frank Reidy Research Center for Bioelectrics, a center devoted to research on biological effects of cold plasma and pulsed electric fields.
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"... it makes a highly valuable contribution to the subject area and will be accessible to scientists and engineers working in the field." ChemPhysChem

"I Think anyone seriously working in this area would find having this book readily available to be a great advantage." ChemPhysChem
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