Now Published   

 









Volume 1

Theory and Instrumentation

S. Asher, University of Pittsburgh, Pittsburgh, PA, USA

D. J. Asunskis, Kansas State University, Manhattan, KS, USA

G. H. Atkinson, University of Arizona, Tucson, AZ, USA

C. D. Bain, University of Oxford, Oxford, UK

D. A. Beattie, University of Oxford, Oxford, UK

R. E. Benner, Process Instruments, Inc., Salt Lake City, UT, USA

D. Bermejo, CSIC, Madrid, Spain

J. E. Bertie, University of Alberta, Edmonton, Canada

D. Besemann, University of Wisconsin, Madison, WI, USA

J. Birch, National Physical Laboratory, Teddington, UK

P. J. Brimmer, Foss Pacific, North Ryde, NSW, Australia

T. Buffeteau, Université de Bordeaux I, Talence, France

H. Buijs, ABB Bomem, Quebec, Canada

M. M. Carrabba, Chromex, Inc., Albany, OR, USA

J. M. Chalmers, The University of Nottingham, Nottingham, UK

B. Chase, E. I. du Pont de Nemours and Co., Inc., Wilmington, DE, USA

M. A. Chesters, The University of Nottingham, Nottingham, UK

S. J. Choquette, National Institute of Standards and Technology, Gaithersburg, MD, USA

F. J. J. Clarke, National Physical Laboratory, Teddington, UK

N. Condon, University of Wisconsin, Madison, WI, USA

M. B. Denton, The University of Arizona, Tucson, AZ, USA

F. A. DeThomas, ABB Automation, Woodstock, MD, USA

R. A. DeVerse, Three LC, Inc., Kailua-Kona, HI, USA

D. L. Duewer, National Institute of Standards and Technology, Gaithersburg, MD, USA

R. K. Dukor, Vysis Inc., Downers Grove, IL, USA

A. J. Eilert, Kansas State University, Manhattan, KS, USA

N. J. Everall, ICI plc, Wilton, Middlesbrough, UK

W. G. Fateley, Three LC, Inc., Manhattan, KS, USA

M. Ford, Perkin-Elmer Ltd, Maidenhead, UK

T. B. Freedman, Vysis Inc., Downers Grove, IL, USA

M. W. George, The University of Nottingham, Nottingham, UK

A. K. Ghosh, MPB Technologies Inc., Pointe Claire, Canada

P. R. Griffiths, University of Idaho, Moscow, ID, USA

D. C. Grills, The University of Nottingham, Nottingham, UK

G. Guelachvili, CNRS, Université Paris-Sud, Orsay Cedex, France

H. Hamaguchi, The University of Tokyo, Tokyo, Japan

R. M. Hammaker, Kansas State University, Manhattan, KS, USA

L. M. Hanssen, National Institute of Standards and Technology, Gaithersburg, MD, USA

M. Hashimoto, Osaka University, Toyonaka, Japan

K. W. Hipps, Washington State University, Pullman, WA, USA

C. Homes, Brookhaven National Laboratory, Upton, NY, USA

W. Hug, University of Fribourg, Fribourg, Switzerland

R. Ikeda, University of Delaware, Newark, DE, USA

T. Iwata, University of Tokushima, Tokushima, Japan

K. Iwata, The University of Tokyo, Tokyo, Japan

R. S. Jackson, Bruker Optics Inc, Billerica, MA, USA

C. Kato, Kanagawa Industrial Technology Research Institute, Ebina, Japan

G. Keresztury, Institute of Chemistry, Hungarian Academy of Sciences, Budapest, Hungary

J. L. Koenig, Case Western Reserve University, Cleveland, OH, USA

R. V. Kruzelecky, MPB Technologies Inc., Pointe Claire, Canada

M. V. Lomonosov, Moscow State University, Moscow, Russia

C. J. Manning, Manning Applied Technology, Troy, ID, USA

A. W. Mantz, Connecticut College, New London, CT, USA

K. Masutani, Micro Science Inc., Tokyo, Japan

U. Mazur, Washington State University, Pullman, WA, USA

W. F. McClure, NC State University, Raleigh, NC, USA

R. L. McCreery, Ohio State University, Columbus, OH, USA

J. L. McHale, University of Idaho, Moscow, ID, USA

D. McNaughton, Monash University, Clayton, Victoria, Australia

K. Meyer, University of Wisconsin, Madison, WI, USA

C. E. Miller, DuPont Engineering Technologies, Houston, TX, USA

G. P. Miller, Sensor Research and Development, Orono, ME, USA

K. Murdoch, University of Wisconsin, Madison, WI, USA

L. A. Nafie, Syracuse University, Syracuse, NY, USA

M. Osawa, Hokkaido University, Sapporo, Japan

H. Owen, Kaiser Optical Systems, Inc., Ann Arbor, MI, USA

R. A. Palmer, Duke University, Durham, NC, USA

M-W. Pan, Process Instruments, Inc., Salt Lake City, UT, USA

S. F. Parker, Rutherford Appleton Laboratory, Chilton, UK

M. J. Pelletier, Kaiser Optical Systems, Inc., Ann Arbor, MI, USA

M. Pézolet, Laval University, Quebec, Canada

N. Picqué, CNRS, Université Paris-Sud, Orsay Cedex, France

P. L. Polavarapu, Vanderbilt University, Nashville, TN, USA

C. J. S. Pommier, The University of Arizona, Tucson, AZ, USA

T. D. Ridder, The University of Arizona, Tucson, AZ, USA

C. Rodger, University of Strathclyde, Glasgow, UK

C. Rödig, Albert-Ludwigs-Universität, Freiburg, Germany

T. C. Rosenthal, Zeltex, Inc., Hagerstown, MD, USA

G. C. Schatz, Northwestern University, Evanston IL, USA

N. Sheppard, University of East Anglia, Norwich, UK

F. Siebert, Albert-Ludwigs-Universität, Freiburg, Germany

L. M. Smith, Process Instruments, Inc., Salt Lake City, UT, USA

G. D. Smith, Duke University, Durham, NC, USA

W. E. Smith, University of Strathclyde, Glasgow, UK

A. W. Springsteen, Avian Technologies, Wilmington, OH, USA

D. L. Stanfield, NC State University, Raleigh, NC, USA

E. W. Stark, KES Analysis, Inc., New York, NY, USA

D. Steele, Royal Holloway, University of London, Egham, UK

J. A. Sweat, Kansas State University, Manhattan, KS, USA

T. Theocharous, National Physical Laboratory, Teddington, UK

J. C. Travis, National Institute of Standards and Technology, Gaithersburg, MD, USA

J. J. Turner, The University of Nottingham, Nottingham, UK

L. Ujj, University of Arizona, Tucson, AZ, USA

R. P. Van Duyne, Northwestern University, Evanston, IL, USA

D. W. Vidrine, Vidrine Consulting, San Juan Capistrano, CA, USA

D. R. Wagner, University of California at Berkeley, Berkeley, USA

L. K. Walton, The University of Arizona, Tucson, AZ, USA

A. Weber, National Institute of Standards and Technology, Gaithersburg, MD, & National Science Foundation, Arlington, VA, USA

D. L. Wetzel, Kansas State University, Manhattan, KS, USA

P. A. Wilks, Wilks Enterprise, South Norwalk, CT, USA

G. P. Williams , Thomas Jefferson National Accelerator Facility, Newport News, VA, USA

J. C. Wright, University of Wisconsin, Madison, WI, USA

T. Yuzawa, The University of Tokyo, Tokyo, Japan

W. Zhao, University of Wisconsin, Madison, WI, USA

A. M. Zheltikov, Moscow State University, Moscow, Russia

C. Zhu, National Institute of Standards and Technology, Gaithersburg, MD, USA

L. D. Ziegler, Boston University, Boston, MA, USA