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Metal Based Thin Films for Electronics, 2nd, Revised and Enlarged Edition

Hardcover

$281.75

Metal Based Thin Films for Electronics, 2nd, Revised and Enlarged Edition

Klaus Wetzig (Editor), Claus M. Schneider (Editor)

ISBN: 978-3-527-40650-0 July 2006 424 Pages

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Description

This up-to-date handbook covers the main topics of preparation, characterization and properties of complex metal-based layer systems. The authors -- an outstanding group of researchers -- discuss advanced methods for structure, chemical and electronic state characterization with reference to the properties of thin functional layers.
This second edition has been completely revised and updated to reflect the rapid progress taking place in the field, including, for example, investigations of the interface between barrier layer and dielectrics in metallization systems, spin-torque induced magnetic switching in spintronics, the development of new metallization technologies for migration-resistant SAW devices, and advancements in the nanoanalytics of thin functional layers.
In addition, several new sections and chapters highlight new and timely research topics, with a whole chapter now devoted to photovoltaics.
As such, the book addresses materials specialists in industry, especially in microelectronics, as well as scientists, while also recommended for advanced studies in materials science, analytics, surface and solid state science.

Preface XI

List of Contributors XIII

1 Introduction 1
Klaus Wetzig, Claus M. Schneider

1.1 Prologue 1

1.2 Organization, Aim and Content of This Book 2

2 Thin Film Systems: Basic Aspects 7

2.1 Interconnects for Microelectronics 7
Ralph Spolenak, Ehrenfried Zschech

2.2 Metallization Structures in Acoustoelectronics 28
Manfred Weihnacht

2.3 Silicide Layers for Electronics 48
Joachim Schumann

2.4 Complex Layered Systems for Magnetoelectronics 71
Claus M. Schneider

2.5 Multilayer and Single-Surface Reflectors for X-Ray Optics 103
Hermann Mai, Stefan Braun

2.6 Metallic Layers for Photovoltaics 122
Winfried Blau

2.7 References 129

3 Thin Film Preparation and Characterization Techniques 141

3.1 Thin Film Preparation Methods 141
Christian Wenzel

3.2 Electron Microscopy and Diffraction 160
Klaus Wetzig, Jürgen Thomas

3.3 X-Ray Scattering Techniques 179
Michael Hecker

3.4 Spectroscopic Techniques 197
Klaus Wetzig

3.5 Stress Measurement Techniques 214
Winfried Brückner

3.6 References 225

4 Challenges for Thin Film Systems Characterization and Optimization 231

4.1 Electromigration in Metallization Layers 231
Ralph Spolenak, Horst Wendrdock, Klaus Wetzig

4.2 Barrier and Nucleation Layers for Interconnects 248
Ehrenfried Zschech

4.3 Acoustomigration in Surface Acoustic Waves Structures 261
Siegfried Menzel, Klaus Wetzig

4.4 Thermal Stability of Magnetoresistive Layer Stacks 283
Claus M. Schneider, Jürgen Thomas

4.5 Functional Magnetic Layers for Sensors and MRAMs 295
Hartmut Vinzelberg, Dieter Elefant

4.6 Multilayers for X-Ray Optical Purposes 309
Hermann Mai, Stefan Braun

4.7 Functional Electric Layers 323
Joachim Schumann, Jürgen Thomas

4.8 References 340

5 Devices 349

5.1 Device Related Aspects for Si-Based Electronics 349
Ehrenfried Zschech

5.2 SAW High Frequency Filters, Resonators and Delay Lines 353
Manfred Weihnacht

5.3 Sensor Devices 362
Christoph Treutler

5.4 X-Ray Optical Systems 373
Hermann Mai, Stefan Braun

5.5 Thermoelectric Sensors and Transducers 383
Joachim Schumann

5.6 References 394

6 Outlook 399
Klaus Wetzig, Claus M. Schneider

6.1 New Functionalities 399

6.2 Materials-Related Aspects 400

6.3 Microelectronics – Quo Vadis? 401

6.4 What You See is What You Get 402

6.5 References 403

Index 405

"...I can certainly agree with the final sentence of the book cover: A perfect introduction to the field-for professionals and students."
Angewandte Chemie 2004 No. 11, Uwe Bornscheuer

"Through its focus on practical aspects and its didactic approach, the book is designed especially for practitioners. It can be highly recommended to materials engineers, physicists or process engineers who work or plan to work in the still exciting field of micro electronics."
Winfried Blau, European Society of Thin Films, Dresden